| Description |
1 online resource (377 p.) |
| Series |
Emerging Materials and Technologies Series |
|
Emerging Materials and Technologies Series
|
| Contents |
Cover -- Half Title -- Series Page -- Title Page -- Copyright Page -- Dedication -- Table of Contents -- Preface -- Acknowledgments -- Author Biographies -- Part I: Introduction to Atomic Layer Deposition -- Chapter 1 Overview of Atomic Layer Deposition and Thin Film Technology -- 1.1 Introduction -- 1.2 Principle of Atomic Layer Deposition -- 1.2.1 Process and Methods -- 1.3 Advantages and Disadvantages of ALD -- 1.3.1 Advantages -- 1.3.2 Disadvantages of ALD -- 1.4 ALD Reactors -- 1.4.1 Types of ALD Reactors -- 1.5 ALD Recipe -- 1.6 ALD Precursors -- 1.7 Applications of ALD |
|
1.7.1 Microelectronics and Semiconductors -- 1.7.2 Energy Storage -- 1.7.3 Desalination Membrane -- 1.7.4 Medical and Biological Applications -- 1.7.5 Optical Components -- 1.7.6 Fuel Cell -- 1.7.7 Protective Film -- 1.8 Challenges and Future Perspectives -- 1.9 Conclusion -- References -- Chapter 2 State of the Art Modeling and Simulation Approaches in ALD -- 2.1 Introduction -- 2.2 Theoretical Modeling Methods -- 2.2.1 Density Functional Theory -- 2.2.2 Molecular Dynamic Simulation -- 2.2.3 Monte Carlo -- 2.2.4 Computational Fluid Dynamic (CFD) |
|
2.3 Challenges and Future Directions in ALD Simulation and Modeling -- 2.4 Conclusion -- References -- Chapter 3 Characterization Methods in ALD -- 3.1 Introduction -- 3.2 Significance of Right Selection of ALD Characterization Techniques -- 3.3 ALD Chemistry -- 3.4 Characterization Methods in ALD -- 3.4.1 Quadrupole Mass Spectrometry (QMS) -- 3.4.2 Quartz Crystal Microbalance (QCM) -- 3.4.3 Spectroscopic Ellipsometry (SE) -- 3.4.4 X-Ray Photoelectron Spectroscopy (XPS) -- 3.4.5 Scanning Electron Microscopy (SEM) -- 3.4.6 Energy-Dispersive X-Ray Spectroscopy (EDS) |
|
3.4.7 Transmission Electron Microscopy (TEM) -- 3.4.8 X-Ray Diffraction (XRD) -- 3.4.9 X-Ray Fluorescence Spectroscopy (XRF) -- 3.4.10 Atomic Force Microscopy (AFM) -- 3.4.11 Thermogravimetric Analysis (TGA) -- 3.5 Conclusion -- References -- Chapter 4 Industry 4.0, Manufacturing Sector and Thin Film Technology -- 4.1 Introduction -- 4.2 A Brief Overview of Industry 4.0 -- 4.3 Features of Industry 4.0 -- 4.3.1 Interconnectivity and Interoperability -- 4.3.2 Advanced Automation and Exponential Technology -- 4.3.3 Data-Driven Decision and Policy Making -- 4.3.4 Customization |
|
4.3.5 Transparency of Information -- 4.4 Industry 4.0 in Manufacturing and Service Sector -- 4.5 Advantages of Industry 4.0 in Manufacturing Industries -- 4.5.1 Improved Production Efficiency, Flexibility, and Agility -- 4.5.2 Customer Satisfaction -- 4.5.3 Real-Time Data-Based Decisions -- 4.5.4 Customization of Smart Products -- 4.5.5 Enhanced Productivity and Less Downtime -- 4.6 Disadvantages of Industry 4.0 in the Manufacturing Industry -- 4.6.1 Inequality Challenge -- 4.6.2 Cyber Threat and Insecurity -- 4.6.3 Job Insecurity and Threat -- 4.6.4 Moral and Ethical Challenges |
| Summary |
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control |
| Notes |
Description based upon print version of record |
|
4.7 Industry 4.0 and Thin Film Technology |
| Form |
Electronic book
|
| Author |
Karimzadeh, Sina
|
|
Jen, Tien-Chien
|
| ISBN |
9781003803119 |
|
1003803113 |
|
