I. GENERAL ; Welcome Address ; Inaugural Address ; Closing Address ; Panel Discussion ; II. DEPOSITION PROCESSES ; Vacuum Technology: Principles and Applications ; PVD Growth Method: Physics and Technology ; Introduction to Semiconductor Epitaxy
Semiconductor Superlattices Oxide Thin Film Growth on Silicon Carbide Surfaces ; Al-W Amorphous Thin Films ; Heat and Mass Transfer During ZnSe CVD Deposition Process ; III. CHARACTERIZATION TECHNIQUES ; Thin Films Analysis Using Photoelectron Spectroscopy
Passivation Investigations of GaAs (100) Surface Correlation Between Microscopic and Macroscopic Properties of Yttria-Stabilized Zirconia Thin Films ; IV. SURFACE PROCESSES ; Reliability and Failure of Electronic Materials and Devices ; Diffusion in Multilayers
Dynamics of Interacting Adatoms on Complex Surfaces Copper Surface Segregation During V2O5 Thin Film Deposition ; The Preparation and Surface Studies of Fe/Pt Thin Films ; 1D-Nanostructures on Silicon Carbide Thin Films
Giant Magnetoresistance in Electrodesposited Nanogranular Thin Films Self-Assembled Quantum Dots: Structural and Optical Properties and Device Applications ; Preparation and Characterization of Ultrathin Films and Film Coatings for Microelectronics
Summary
Thin films science and technology plays an important role in the high-tech industries. Thin film technology has been developed primarily for the need of the integrated circuit industry. The demand for development of smaller and smaller devices with higher speed especially in new generation of integrated circuits requires advanced materials and new processing techniques suitable for future giga scale integration (GSI) technology. In this regard, physics and technology of thin films can play an important role to achieve this goal. The production of thin films for device purposes has been develo
