| Description |
1 online resource (x, 188 pages) : illustrations |
| Series |
Optics and Photonics ; 10 |
|
Optics and photonics (Boca Raton, Fla.) ; 10.
|
| Contents |
Basic Idea of Photopolymerization -- Chemically Amplified Resists -- Process of Chemically Amplified Resists -- Nanoimprint -- Industrial Application of Photopolymers |
| Summary |
Advancements in photopolymers have led to groundbreaking achievements in the electronics, print, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, printing plates, 3-D printing, microelectromechanical systems (MEMS), and medical materials. Processes such as photopolymerization, photodegradation, and photocrosslinking, as well as lithography technology in which photofabrications are performed by images of photopolymers, have given rise to very large-scale integrated (VLSI) circuits, microproducts, and more |
| Bibliography |
Includes bibliographical references and index |
| Notes |
Print version record |
| Subject |
Microelectronics -- Materials
|
|
Photopolymerization.
|
|
Photopolymers -- Industrial applications
|
|
Photopolymers.
|
|
Photoresists.
|
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TECHNOLOGY & ENGINEERING -- Engineering (General)
|
|
TECHNOLOGY & ENGINEERING -- Reference.
|
|
Microelectronics -- Materials.
|
|
Photopolymerization.
|
|
Photopolymers.
|
|
Photopolymers -- Industrial applications.
|
|
Photoresists.
|
| Form |
Electronic book
|
| ISBN |
9781466517318 |
|
146651731X |
|
