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Author Nakamura, Kenichiro (Chemical engineer), author.

Title Photopolymers : photoresist materials, processes, and applications / Kenichiro Nakamura
Published Boca Raton, FL : CRC Press/Taylor & Francis Group, [2015]
©2015
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Description 1 online resource (x, 188 pages) : illustrations
Series Optics and Photonics ; 10
Optics and photonics (Boca Raton, Fla.) ; 10.
Contents Basic Idea of Photopolymerization -- Chemically Amplified Resists -- Process of Chemically Amplified Resists -- Nanoimprint -- Industrial Application of Photopolymers
Summary Advancements in photopolymers have led to groundbreaking achievements in the electronics, print, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, printing plates, 3-D printing, microelectromechanical systems (MEMS), and medical materials. Processes such as photopolymerization, photodegradation, and photocrosslinking, as well as lithography technology in which photofabrications are performed by images of photopolymers, have given rise to very large-scale integrated (VLSI) circuits, microproducts, and more
Bibliography Includes bibliographical references and index
Notes Print version record
Subject Microelectronics -- Materials
Photopolymerization.
Photopolymers -- Industrial applications
Photopolymers.
Photoresists.
TECHNOLOGY & ENGINEERING -- Engineering (General)
TECHNOLOGY & ENGINEERING -- Reference.
Microelectronics -- Materials.
Photopolymerization.
Photopolymers.
Photopolymers -- Industrial applications.
Photoresists.
Form Electronic book
ISBN 9781466517318
146651731X