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Title Silicon-germanium (SiGe) nanostructures : production, properties and applications in electronics / edited by Yasuhiro Shiraki and Noritaka Usami
Published Cambridge, UK : Philadelphia, PA : Woodhead Pub., 2011


Description 1 online resource (xx, 627 pages) : illustrations
Series Woodhead Publishing in materials
Woodhead Publishing in materials.
Contents Part 1 Introduction: Structural properties of silicon-germanium (SiGe) nanostructures -- Electronic band structures of SiGe alloys. Part 2 Formation of nanostructures: Understanding crystal growth mechanisms in SiGe nanostructures -- Types of SiGe bulk crystal growth methods and their applications -- SiGe crystal growth using molecular beam epitaxy -- SiGe crystal growth using chemical vapour deposition -- Strain engineering of SiGe virtual substrates -- Formation of silicon-germanium-on-insulator (SGOI)substrates -- Miscellaneous methods and materials for SiGe based heterostructures -- Modelling the evolution of germanium islands on silicon(001) thin films -- Strain engineering of SiGe micro- and nanostructures. Part 3 Material properties of SiGe nanostructures: Self-diffusion and dopant diffusion in germanium (Ge) and SiGe alloys -- Dislocations and other strain-induced defects in SiGe nanostructures -- Transport properties of SiGe nanostructures at low temperatures -- Transport properties of SiGe nanostructures and applications in devices -- Microcavities and quantum cascade laser structures based on SiGe nanostructures -- Silicide and germanide technology for interconnections in ultra large scale integrated (ULSI) applications. Part 4 Devices using Si, Ge and SiGe alloys: SiGe heterojunction bipolar transistor (HBT) and bipolar complementary metal oxide semiconductor (BiCMOS) technologies -- SiGe-based field effect transistors (FET) and complementary metal oxide semiconductor (CMOS) technologies -- High electron mobility germanium (Ge) metal oxide semiconductor field effect transistors (MOSFETs) -- Silicon (Si) and germanium (Ge) in optical devices -- Spintronics of nanostructured MnGe dilute magnetic semiconductor
Summary Annotation Nanostructured silicon-germanium (SiGe) opens up the prospects of novel and enhanced electronic device performance, especially for semiconductor devices. Silicon-germanium (SiGe) nanostructuresreviews the materials science of nanostructures and their properties and applications in different electronic devices. The introductory part one covers the structural properties of SiGe nanostructures, with a further chapter discussing electronic band structures of SiGe alloys. Part two concentrates on the formation of SiGe nanostructures, with chapters on different methods of crystal growth such as molecular beam epitaxy and chemical vapor deposition. This part also includes chapters covering strain engineering and modeling. Part three covers the material properties of SiGe nanostructures, including chapters on such topics as strain-induced defects, transport properties and microcavities and quantum cascade laser structures. In Part four, chapters cover ultra large scale integrated applications, MOSFETs and the use of SiGe in different types of transistors and optical devices -- Source other than Library of Congress
Bibliography Includes bibliographical references and index
Notes Print version record
Subject Nanostructured materials.
Silicon alloys.
Germanium alloys.
Electronic circuits.
Electronic circuits
Germanium alloys
Nanostructured materials
Silicon alloys
Nanostrukturiertes Material
Form Electronic book
Author Shiraki, Yasuhiro, 1942-
Usami, Noritaka.
LC no. 2013427739
ISBN 9781613443729