| Description |
1 online resource (x, 263 pages) : illustrations (some color) |
| Contents |
Fundamentals -- ALD for memory devices -- ALD for logic devices -- ALD machines |
| Summary |
Atomic Layer Deposition (ALD) was originally designed for depositing uniform passivation layers over a very large area for display devices in the late 1970s. Only recently, in the 21st century, has the this technique become popular for high integrated semiconductor memory devices. This book discusses ALD for all modern semiconductor devices, the basic chemistry of ALD, and models of ALD processes. The book also details ALD for both mass produced memories and emerging memories. Each chapter of the book provides history, operating principles, and a full explanation of ALD processes for each device |
| Notes |
Includes index |
| Bibliography |
Includes bibliographical references and index |
| Notes |
Online resource; title from PDF title page (SpringerLink, viewed October 21, 2013) |
| Subject |
Semiconductors -- Surfaces
|
|
TECHNOLOGY & ENGINEERING -- Mechanical.
|
|
Semiconductors -- Surfaces
|
| Form |
Electronic book
|
| Author |
Seong Hwang, Cheol, editor
|
|
Yoo, Cha Young, editor
|
| ISBN |
9781461480549 |
|
146148054X |
|
1461480531 |
|
9781461480532 |
|
