| Description |
1 online resource (145 p.) |
| Series |
Emerging Materials and Technologies Ser |
|
Emerging Materials and Technologies Ser
|
| Contents |
Cover -- Half Title -- Series -- Title -- Copyright -- Dedication -- Contents -- Acknowledgements -- Author Biographies -- Acronyms -- Chapter 1 Historical Background and Place in the Lithography Roadmap -- 1.1. Introduction to Nanolithography by AFM -- 1.2. Historical Background -- 1.3. AFM: The Most Versatile Tool at the Nanoscale -- 1.4. Book Scheme -- Chapter References -- Chapter 2 Basic Concepts and Modalities -- 2.1. The Tool: An Atomic Force Microscope -- 2.2. An Atomic Force Microscope for Lithography -- 2.3. Preparing a Scanning Probe Lithography Experiment |
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2.4. "How to Name the Technique?" -- Chapter References -- Chapter 3 Mechanical Scanning Probe Lithography -- 3.1. Fundamentals -- 3.2. Parameters for the Lithographic Process -- 3.3. Manipulation of Nano-Objects -- 3.4. Cleaning of 2D Materials Post-Processing -- 3.5. Applications and Proof of Concepts -- 3.5.1. Lift-Off and Pattern Transfer Processes -- 3.5.2. Templates -- 3.5.3. Charge Modulation in Quantum Devices -- 3.5.4. 2D Materials Based Devices and Patterns -- 3.5.5. Other Proof-of-Concept Devices and Nanostructures -- Chapter References -- Chapter 4 Dip Pen Nanolithography |
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4.1. Fundamentals -- 4.1.1. Type of Inks -- 4.1.2. Material Transport Models -- (a) Molecular Diffusion in the Case of Diffusive Inks -- (b) Mass Fluid Flow in the Case of Liquid Inks -- 4.1.3. Derivatives of Dip Pen Nanolithography Method -- 4.1.4. Developments on the Tool -- 4.2. Parameters for the Lithographic Process -- 4.2.1. Tip -- 4.2.2. Surface -- 4.2.3. Ink -- 4.2.4. Writing Conditions -- 4.3. Electrochemical and Thermal Dip Pen Nanolithography -- 4.4. Applications -- 4.4.1. Etching Masks and Chemical Templates -- 4.4.2. Biomolecular or Organic Molecule Patterns |
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4.4.3. Inorganic Patterns -- Chapter References -- Chapter 5 Field Emission Scanning Probe Lithography -- 5.1. Fundamentals -- 5.2. Parameters for the Lithographic Process -- 5.3. Towards Single-Digit Nanometer Lithography -- 5.4. Other Processes Driven by fe-SPL -- Chapter References -- Chapter 6 Oxidation Scanning Probe Lithography -- 6.1. Fundamentals -- 6.1.1. Oxide Growth Kinetics -- 6.1.2. Composition of the Oxides Fabricated by o-SPL -- 6.1.3. Growth of Oxides over and under the Substrate Surface -- 6.2. Parameters for the Lithographic Process |
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6.3. Tunability of o-SPL Processes: Polarity and Atmosphere -- 6.4. Applications and Proof of Concepts -- 6.4.1. Lift-Off and Pattern Transfer Processes -- 6.4.2. Templates -- 6.4.3. Barriers for Quantum Devices -- 6.4.4. Control over Metallic/Insulating State Transitions -- 6.4.5. 2D Materials Based Devices and Patterns -- 6.4.6. Other Proof-of-Concept Devices and Nanostructures -- Chapter References -- Chapter 7 Thermal Scanning Probe Lithography -- 7.1. Fundamentals and Components of the Tool -- 7.2. From the Millipede to the NanoFrazor -- 7.2.1. The Cantilever |
| Summary |
This work details the modalities, mechanisms, technologies, applications, and materials on which Scanning Probe Lithography can be performed. It provides an overview of this simple and cost-effective technique, which can be performed in any lab or facility to achieve high-resolution and high-quality patterns on a wide range of 2D materials |
| Notes |
Description based upon print version of record |
|
7.2.2. The Tool and the Technique |
| Subject |
Microlithography -- Industrial applications
|
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Scanning probe microscopy.
|
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Microlithography -- Industrial applications
|
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Scanning probe microscopy
|
| Form |
Electronic book
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| Author |
Rodrigo, Javier Martinez
|
| ISBN |
9781000804867 |
|
1000804860 |
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