Title Metal-dielectric interfaces in gigascale electronics : thermal and electrical stability / Ming He, Toh-Ming Lu

Published New York : Springer Science+Business Media, LLC, ©2012

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Description 1 online resource (xi, 149 pages) : illustrations (some color) Series Springer series in materials science, 0933-033X ; v. 157 Springer series in materials science ; v. 157. Contents Preface -- 1. Introduction -- 2. Metal-Dielectric Diffusion Processes: Fundamentals -- 3. Experimental Techniques -- 4. Al-Dielectric Interfaces -- 5. Cu-Dielectric Interfaces -- 6. Barrier Metal-Dielectric Interfaces -- 7. Self-Forming Barriers. 8. Kinetics of Ion Drift -- 9. Time-Dependent Dielectric Breakdown (TDDB) and Future Directions Summary Metal-dielectric interfaces are ubiquitous in modern electronics. As advanced gigascale electronic devices continue to shrink, the stability of these interfaces is becoming an increasingly important issue that has a profound impact on the operational reliability of these devices. In this book, the authors present the basic science underlying the thermal and electrical stability of metal-dielectric interfaces and its relationship to the operation of advanced interconnect systems in gigascale electronics. Interface phenomena, including chemical reactions between metals and dielectrics, metallic-atom diffusion, and ion drift, are discussed based on fundamental physical and chemical principles. Schematic diagrams are provided throughout the book to illustrate interface phenomena and the principles that govern them. Metal-Dielectric Interfaces in Gigascale Electronics provides a unifying approach to the diverse and sometimes contradictory test results that are reported in the literature on metal-dielectric interfaces. The goal is to provide readers with a clear account of the relationship between interface science and its applications in interconnect structures. The material presented here will also be of interest to those engaged in field-effect transistor and memristor device research, as well as university researchers and industrial scientists working in the areas of electronic materials processing, semiconductor manufacturing, memory chips, and IC design. Presents a unified approach to understanding the diverse phenomena observed at metal-dielectric interfaces Features fundamental considerations in the physics and chemistry of metal-dielectric interactions Explores mechanisms of metal atom diffusion and metal ion drift in dielectrics Provides keys to understanding reliability in gigascale electronics Focuses on a dynamic area of current research that is a foundation of future interconnect systems, memristors, and solid-state electrolyte devices Presents a unified approach to understanding the diverse phenomena observed at metal-dielectric interfaces Analysis Engineering Chemistry Electronics Optical materials Electronics and Microelectronics, Instrumentation Optical and Electronic Materials Surface and Interface Science, Thin Films Nanotechnology and Microengineering Electrochemistry Engineering Thermodynamics, Heat and Mass Transfer elektronica instrumentatie instrumentation optische instrumenten optical instruments optica optics nanotechnologie nanotechnology elektrochemie thermodynamica thermodynamics oppervlakteverschijnselen surface phenomena oppervlakten surfaces grensvlak interface Engineering (General) Techniek (algemeen) Bibliography Includes bibliographical references and index Subject Microelectronics -- Materials Interfaces (Physical sciences) TECHNOLOGY & ENGINEERING -- Mechanical. Physique. Astronomie. Interfaces (Physical sciences) Microelectronics -- Materials Form Electronic book Author Lu, T.-M. (Toh-Ming), 1943- ISBN 9781461418122 1461418127

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