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Book Cover
E-book
Author Feenstra, Randall M.

Title Porous silicon carbide and gallium nitride : epitaxy, catalysis, and biotechnology applications / Randall M. Feenstra, Colin E.C. Wood
Published Chichester, England ; Hoboken, NJ : John Wiley & Sons, [2008]
©2008
Online access available from:
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Description 1 online resource (xiv, 318 pages, 6 unnumbered pages of plates) : illustrations (some color)
Contents Porous Silicon Carbide and Gallium Nitride; Contents; Preface; 1 Porous SiC Preparation, Characterization and Morphology; 2 Processing Porous SiC: Diffusion, Oxidation, Contact Formation; 3 Growth of SiC on Porous SiC Buffer Layers; 4 Preparation and Properties of Porous GaN Fabricated by Metal-Assisted Electroless Etching; 5 Growth of GaN on Porous SiC by Molecular Beam Epitaxy; 6 GaN Lateral Epitaxy Growth Using Porous SiNx, TiNx and SiC; 7 HVPE Growth of GaN on Porous SiC Substrates; 8 Dislocation Mechanisms in GaN Films Grown on Porous Substrates or Interlayers
Summary Porous Silicon Carbide and Gallium Nitride: Epitaxy, Catalysis, and Biotechnology Applications presents the state-of-the-art in knowledge and applications of porous semiconductor materials having a wide band gap. This comprehensive reference begins℗¡with an overview of porous wide-band-gap technology, and describes the℗¡underlying scientific basis for each application area.℗¡Additional chapters cover preparation, characterization, and topography; processing porous SiC; medical applications; magnetic ion behavior, and many more
Bibliography Includes bibliographical references (pages 308-310) and index
Notes Print version record
Subject Gallium nitride.
Semiconductors.
Silicon carbide.
Form Electronic book
Author Wood, Colin E. C.
Wiley InterScience (Online service)
LC no. 2007046623
ISBN 0470751819
0470751827 (electronic bk.)
1281322458
9780470751817
9780470751824 (electronic bk.)
9781281322456
(hbk. ; alk. paper)
(hbk. ; alk. paper)