| Description |
1 online resource (341 p.) |
| Contents |
Cover -- Half Title -- Title Page -- Copyright Page -- Dedication -- Table of Contents -- Preface -- Acknowledgments -- Authors -- Introduction -- Chapter 1 Chemical Vapor Deposition of Two-Dimensional Semiconductors -- 1.1 Overview -- 1.2 The Key Parameters of CVD Growth of 2D Materials -- 1.2.1 Precursor -- 1.2.2 Temperature -- 1.2.3 Pressure -- 1.2.4 Substrate -- 1.2.5 Other Technological Parameters -- 1.3 The CVD Growth of 2D Materials -- 1.3.1 Grain Size of 2D Materials -- 1.3.2 Layer Number of 2D Materials -- 1.3.3 Orientation -- 1.3.4 Morphology -- 1.3.5 Phase -- 1.3.6 Doping |
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1.3.7 Quality and Defects -- 1.4 The Wafer-Scale CVD Growth of Continuous 2D Materials -- 1.4.1 Continuous CVD Growth of 2D TMDC Films on Rigid Substrates -- 1.4.1.1 MOCVD -- 1.4.1.2 Conventional CVD Techniques -- 1.4.1.3 Other Thin-Film Deposition Method -- 1.4.2 Continuous CVD Growth of 2D TMDC Films on Flexible Substrates -- 1.5 The CVD Growth of Heterostructured 2D Materials -- 1.5.1 CVD Growth of Vertical 2D Heterostructures -- 1.5.1.1 CVD Growth of Metal/Semiconductor Vertical 2D Heterostructures -- 1.5.1.2 CVD-Grown Semiconductor/Semiconductor Vertical 2D Heterostructures |
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1.5.1.3 CVD Growth of Semiconductor/Insulator Vertical 2D Heterostructures -- 1.5.1.4 CVD Growth of Metal/Insulator Vertical 2D Heterostructures -- 1.5.2 CVD Growth of Lateral 2D Heterostructures -- 1.5.2.1 CVD Growth of Semiconductor/Semiconductor Lateral 2D Heterostructures -- 1.5.2.2 CVD Growth of Metal/Insulator Lateral 2D Heterostructures -- 1.6 Future Outlook of CVD of 2D Materials -- References -- Chapter 2 Atomic Layer Deposition of Two-Dimensional Semiconductors -- 2.1 Overview of ALD Technique of 2D Materials -- 2.2 ALD Parameters -- 2.2.1 ALD Window -- 2.2.2 ALD Precursors |
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2.3 ALD of 2D Metal Chalcogenide Films -- 2.3.1 ALD of 2D MoS2 -- 2.3.2 ALD of 2D WS2 -- 2.3.3 ALD of 2D WSe2 -- 2.3.4 ALD of Layered SnS and SnS2 Films -- 2.3.5 ALD of Layered Metal Dichalcogenide Heterostructures -- 2.4 ALD of 2D Metal Oxide Films -- 2.4.1 ALD of 2D MoO3 -- 2.4.2 ALD of 2D WO3 -- 2.4.3 ALD of 2D TiO2 -- 2.4.4 ALD of 2D Al2O3 -- 2.5 Conclusion -- References -- Chapter 3 Self-Limiting Two-Dimensional Surface Oxides of Liquid Metals -- 3.1 Introduction -- 3.2 The Fundamental Properties of Liquid Metals -- 3.2.1 Monophasic and Biphasic Liquid Metals and Alloys |
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3.2.2 Characteristics of the Liquid Metal Interface -- 3.3 Synthesis and Applications of 2D Surface Oxides of Liquid Metals -- 3.3.1 Screen Printing of 2D Semiconductors -- 3.3.1.1 Screen Printing of Ga2O3 and GaS 2D Films -- 3.3.1.2 Wafer-Scale Screen Printing of GaS 2D Films -- 3.3.2 Reactive Environment for Synthesis of 2D Semiconductor Films -- 3.3.3 Liquid Metal Media for Green Synthesis of Ultrathin Flux Membranes -- 3.3.4 The vdW Exfoliation and Printing Methods of 2D Semiconductors -- 3.3.4.1 Semiconducting SnO Monolayers -- 3.3.4.2 Semiconducting 2D Gallium Phosphate Nanosheets |
| Notes |
Description based upon print version of record |
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3.3.4.3 Semiconducting GaN and InN Nanosheets |
| Form |
Electronic book
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| Author |
Akbari, Mohammad Karbalaei
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| ISBN |
9781000072464 |
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1000072460 |
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